SANTA CLARA, Calif. – During the SPIE Microlithography conference here, IBM Corp. and Nikon Corp. announced demonstration of a “real” wafer exposure tool, based on electron-beam projection lithography ...
MONTEREY, Calif. — Hoping to take a lead in the next-generation lithography (NGL) race, Japan's Nikon Corp. today announced what appears to be the world's first photomask blank for exposure tools ...
Traditional lithography remains a standard in the industry, providing precision and a relatively cost-effective way to create patterns on the wafer when producing very high volumes of chips. However, ...
In addition, it is the only production lithography tool capable of sub 50 nm geometries on 200 mm wafers. Uniquely configured with multiple miniaturized electron beam columns, the MB platform elevates ...
Over the past few years we’ve seen several impressive projects where people try to manufacture integrated circuits using hobbyist tools. One of the most complex parts of this process is lithography: ...
TOKYO--(BUSINESS WIRE)--Advantest Corporation (TSE: 6857, NYSE: ATE) May 19, 2015 - Leading semiconductor equipment supplier Advantest Corporation announces that imec has selected its leading-edge ...
The Elionix ELS-G100 electron beam lithography system produces a highly stable beam with a diameter as small 1.8nm, using acceleration voltages of up to 100kV and high beam currents. This allows fine ...
KemLab Inc., a pioneering developer of advanced materials for microelectronics and MEMS applications, is pleased to offer a high-quality solution tailored to address the requirements of ...
MUNICH, Germany, Sept. 18, 2019 (GLOBE NEWSWIRE) -- Leading semiconductor test equipment supplier Advantest Corporation (TSE: 6857) will feature its F7000 electron-beam (EB) lithography system and ...
BLOOMINGTON, Minn. & SANTA CLARA, Calif.--(BUSINESS WIRE)--SkyWater Technology (NASDAQ: SKYT) announced today that it has received from Multibeam Corp., a first-of-a-kind Multicolumn E-Beam ...
The Elionix ELS-G100 electron beam lithography system produces a highly stable beam with a diameter as small 1.8nm, using acceleration voltages of up to 100kV and high beam currents. This allows fine ...
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