Vitrek’s Cost-Sensitive Accumeasure Capacitance-Based Metrology System Simplifies the Development of Adaptable ...
Abstract: This work presents an overview of the latest advancements in monochromatic ellipsometry, tracing its evolution from early null ellipsometry to widely commercialized rotating ellipsometry, ...
A new technical paper titled “Ultra-wide-field imaging Mueller matrix spectroscopic ellipsometry for semiconductor metrology” was published by researchers at Samsung. “We propose an ultra-wide-field ...
Artificial intelligence is one of the driving forces in today’s semiconductor industry, with more traditional market drivers like high performance compute and smart phones continuing to play important ...
WILMINGTON, Mass.--(BUSINESS WIRE)--Onto Innovation Inc. (NYSE: ONTO) today announced that a leading DRAM manufacturer has finalized a $69 million volume purchase agreement spanning Onto Innovation’s ...
This free of charge workshop is aimed at both experienced ellipsometry users as well as people new to ellipsometry. The format of the workshop includes an introduction, fundamentals of ellipsometric ...
Myungkoo Kang (left), S.K. Sundaram (center), and Mehdi Kabir. Alfred University is recipient of a National Science Foundation (NSF) grant of nearly $350,000, which will be used to acquire equipment ...
Polarization is a fundamental property of light waves. Polarization information of the light interacted with an object can be used to reveal its physical properties of interest, such as material, ...
A new publication from Opto-Electronic Advances, 10.29026/oea.2023.230048 discusses an all-fiber ellipsometer for nanoscale dielectric coatings. Measuring the refractive index and the thickness of ...
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